LABORATORY

This is a unique infrastructure in Hungary, can support the micro- and nanotechnology based system technology applicable for fabrication complex, purpose-designed microsystems, nanocircuits, as well as Lab-on-a-Chip devices.

The high-tech microtechnology related fabrication and characterisation systems work in a class 10 cleanroom facility. The laboratory is dedicated for 3D processing of 3” and 4” Si / glass / polymer substrates with maximal resolution of 1µm, together with lithographic mask manufacturing. Electron beam lithography and focused ion beam (FIB) milling are also available with resolution of 20nm.

PATTERNING

Mask shop

  • Laser Pattern Generator (1μm resolution)
  • Chromium mask design (4 – 7 inch)
  • Direct wafer writing (3 – 6 inch)

Photolitography

  • 1μm resolution
  • Subattractive patterning
  • Lift-off patterning
  • High aspect ratio photoresists
  • Double side alignment
  • Pre-bond wafer alignment